The 80th JSAP Autumn Meeting 2019

Presentation information

Poster presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-PA4-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Sep 20, 2019 9:30 AM - 11:30 AM PA4 (PA)

9:30 AM - 11:30 AM

[20a-PA4-7] Droplet-Vaporization Behavior in Plasma during Plasma-assisted Mist Chemical Vapor Deposition (II)

Kosuke Takenaka1, Yuichi Setsuhara1 (1.Osaka Univ.)

Keywords:Mist CVD