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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[20p-B11-1~12] 8.1 Plasma production and diagnostics

Fri. Sep 20, 2019 1:15 PM - 5:15 PM B11 (B11)

Shusuke Nishiyama(Hokkaido Univ.), Mineo Hiramatsu(Meijo Univ.)

3:15 PM - 3:30 PM

△ [20p-B11-6] Production and optical emission spectroscopy ofradio frequency hollow cathode discharge plasmausing Ar/O₂ mixed gas for high-speed ashing of polyimide film

〇Shinnosuke Honda¹, Yasunori Ohtsu¹, Yuta Ino¹, Yuto Fukunaga¹ (1.Saga Univ.)

Keywords:Ashing