The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[20p-E310-1~21] 15.4 III-V-group nitride crystals

Fri. Sep 20, 2019 1:15 PM - 7:00 PM E310 (E310)

Narihito Okada(Yamaguchi Univ.), Yoshio Honda(Nagoya Univ.), Tomoyuki Tanikawa(Osaka Univ.)

5:00 PM - 5:15 PM

[20p-E310-15] Precise composition control for AlInN/GaN DBRs by in-situ curvature measurements

〇(M2)Kei Hiraiwa1, Wataru Muranaga1, Sho Iwayama1, Kazuki Kiyohara1, Tetsuya Takeuchi1, Satoshi Kamiyama1, Motoaki Iwaya1, Isamu Akasaki1,2 (1.Meijo Univ., 2.ARC Nagoya Univ.)

Keywords:DBR, AlInN, Curvature

As one of approaches to fabricate high quality AlInN/GaN DBRs, in-situ curvature measurement has been reported. The lattice constant of the AlInN layer can be grasped from the slope which is with respect to time of the curvature profile. If the structure is uniform, the slope should be constant. In this study, as epi growth progresses, the slope was not constant but changed in the negative(compressive) direction. The factor may be an increase in InN molar fraction.