Evaluation of the process damage induced by sputtering deposition of transparent conductive oxide film.

Hiroki Kanai; Tappei Nishihara; Takehumi Kamioka; Junsuke Matsuzaki; Hirohisa Takahashi; Junya Kiyota; Satoshi Yasuno; Ichiro Hirosawa; Atsushi Ogura

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

[20p-E314-1~14] 16.3 Bulk, thin-film and other silicon-based solar cells

Fri. Sep 20, 2019 1:30 PM - 5:15 PM E314 (E314)

Mitsuhiro Matsumoto(Panasonic), Ryosuke Ishikawa(Tokyo City Univ.)

2:30 PM - 2:45 PM

△ [20p-E314-5] Evaluation of the process damage induced by sputtering deposition of transparent conductive oxide film.

〇Hiroki Kanai¹, Tappei Nishihara¹, Takehumi Kamioka¹, Junsuke Matsuzaki², Hirohisa Takahashi², Junya Kiyota², Satoshi Yasuno³, Ichiro Hirosawa³, Atsushi Ogura¹ (1.Meiji Univ., 2.ULVAC, 3.JASRI)

Keywords:Silicon Heterojunction solar cell, Sputtering, Process damage

We evaluated the process damage induced by sputtering deposition of transparent conductive oxide film.