Daisuke Tahara

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 9:00 AM - 12:00 PM W351 (W351)

Oral presentation
| 6 Thin Films and Surfaces
| 6.1 Ferroelectric thin films

[11a-W351-1~11] 6.1 Ferroelectric thin films

9:15 AM - 9:30 AM

[11a-W351-2] Crystal growth of HfO₂ films on n⁺-Si (100) substrates by mist chemical vapor deposition and evaluation of its electrical characteristics

〇(D)Daisuke Tahara¹, Hiroyuki Nishinaka¹, Minoru Noda¹, Shota Sato², Toshiyuki Kawaharamura², Masahiro Yoshimoto¹ (1.Kyoto Inst. Tech., 2.Kochi Univ. Tech.)

Mon. Mar 11, 2019 1:45 PM - 6:45 PM S011 (South Lecture Bldg.)

Oral presentation
| 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[11p-S011-1~18] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

4:15 PM - 4:30 PM

△ [11p-S011-10] Epitaxial growth of α-(In_xAl_1-x)₂O₃ alloy films by mist chemical vapor deposition

〇(D)Daisuke Tahara¹, Hiroyuki Nishinaka¹, Yuta Arata¹, Masahiro Yoshimoto¹ (1.Kyoto Inst. Tech.)

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