Yoshiki Shirasu

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:15 PM - 4:30 PM

△ [11p-W641-10] Copper dry etching by water-vapor aided hydrogen plasma

〇Yoshiki Shirasu¹, Takuhiro Ando¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka Univ.)