Daisuke Ohori

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Speaker, Author, Co-Author

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:00 PM - 5:15 PM

[11p-W641-13] Investigation of Side-wall Etching for Germanium Fin Strcutre by Neutral Beam Etching

〇(PC)Daisuke Ohori¹, Shuichi Noda², Takuya Fujii¹, Wataru Mizubayashi², Kazuhiko Endo^1,2, En-Tzu Lee¹, Yiming Li³, Yao-Jen Lee⁴, Takuya Ozaki¹, Seiji Samukawa^1,2,5 (1.IFS, Tohoku Univ., 2.AIST, 3.NCTU, 4.NDL, 5.AIMR, Tohoku Univ.)

Sat. Mar 9, 2019 1:45 PM - 6:15 PM W371 (W371)

Oral presentation
| 22 Joint Session M ”Phonon Engineering”
| 22.1 Joint Session M "Phonon Engineering"

[9p-W371-1~16] 22.1 Joint Session M "Phonon Engineering"

3:30 PM - 3:45 PM

△ [9p-W371-7] Characteristics of Carrier Mobility and Phonon Scattering by Controlling Spacing of Si Nanopillars in SiGe

〇(PC)Daisuke Ohori¹, Hidesato Kuboyama⁴, Masayuki Murata³, Atsushi Yamamoto³, Masahiro Nomura⁵, Kazuhiko Endo^1,3, Seiji Samukawa^1,2,3 (1.IFS, Tohoku Univ., 2.AIMR, Tohoku Univ., 3.AIST, 4.TUS, 5.IIS, Univ. of Tokyo)

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