Symposium (Oral)

[10p-M103-1~7] Carbon related materials and plasma processing; state of the art and subjects

Sun. Mar 10, 2019 1:30 PM - 4:25 PM M103 (H103)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:35 PM

[10p-M103-1] Introductory talk

〇Hideaki Yamada¹ (1.AIST)

1:35 PM - 2:05 PM

[10p-M103-2] Current Situation and Future Prospect of DLC Deposition Technology

〇Masanori Hiratsuka¹ (1.Nanotec corp.)

2:05 PM - 2:35 PM

[10p-M103-3] Challenge to carbon hard mask for high aspect ratio dielectric film patterning

〇Kei Watanabe¹ (1.Toshiba Memory)

2:35 PM - 3:05 PM

[10p-M103-4] Molecular Simulation for Plasma Elementary Processes of Carbon Material

〇Atsushi M Ito¹, Arimichi Takayama¹, Hiroaki Nakamura^1,2 (1.NIFS, 2.Nagoya Univ.)

3:10 PM - 3:40 PM

[10p-M103-5] Plasma Processing toward Integrated Synthesis and Non-Volatile Memory Applications of Graphene Nanoribbon

〇Toshiaki Kato^1,2, Hiroo Suzuki¹, Toshiro Kaneko¹ (1.Dep. Electronic Engineering, Tohoku Univ., 2.JST-PRESTO)

3:40 PM - 3:55 PM

△ [10p-M103-6] In-situ transmission electron microscopy observation of layer-by-layer etching of graphene under remote oxygen plasma irradiation

〇Hirotsugu Sugiura¹, Hiroki Kondo¹, Kimitaka Higuchi², Shigeo Arai², Takayoshi Tsutsumi¹, Kenji Ishikawa¹, Masaru Hori³ (1.Nagoya Univ., 2.Nagoya Univ. IMaSS, 3.Nagoya Univ. Inst. of Innovation for Future Society)

3:55 PM - 4:25 PM

[10p-M103-7] Plasma processing for diamond electronics

〇Mutsuko Hatano¹, Takayuki Iwasaki¹ (1.Tokyo Tech)

Sessions

Symposium » Carbon related materials and plasma processing; state of the art and subjects