The 66th JSAP Spring Meeting, 2019

Presentation information

Symposium (Oral)

Symposium » Progress of characterization and monitoring techniques that reveal fundamental of light process

[10p-M114-1~12] Progress of characterization and monitoring techniques that reveal fundamental of light process

Sun. Mar 10, 2019 1:30 PM - 6:15 PM M114 (H114)

Daisuke Nakamura(Kyushu Univ.)

4:15 PM - 4:30 PM

[10p-M114-6] Time-resolved imaging of photoresist stripping dynamics induced by laser irradiation II

〇(B)Naoki Nishioka1,3, Yuji Umeda1, Yusuke Funamoto1, Daichi Shima1, Tomosumi Kamimura1, Hideo Horibe2, Masashi Yoshimura3, Ryosuke Nakamura3 (1.Osaka Inst Tech Univ., 2.Osaka City Univ., 3.Osaka Univ.)

Keywords:optics, laser damage