The 66th JSAP Spring Meeting, 2019

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Symposium (Oral)

Symposium » Progress in ion implantation for semiconductor devices -Si, GaAs and WBG materials-

[10p-W922-1~8] Progress in ion implantation for semiconductor devices -Si, GaAs and WBG materials-

Sun. Mar 10, 2019 1:30 PM - 5:50 PM W922 (Multi-Purpose Digital Hall)

Masayuki Imaizumi(Mitsubishi Electric), Tohru Oka(Toyoda Gosei)

1:30 PM - 2:00 PM

[10p-W922-1] Ion Implantation – History has a lot to teach us -

〇Osamu Eryu1 (1.Nagoya Inst. Tech)

Keywords:ion implantation, device process

The purpose of this lecture focuses on a technical problem in 1980 's and understands a wonderful tool as black box-ized ion implantation, and is to link it to the electronic device formation which would show in the future.