The 66th JSAP Spring Meeting, 2019

Session information

Symposium (Oral)

Symposium » Progress in ion implantation for semiconductor devices -Si, GaAs and WBG materials-

[10p-W922-1~8] Progress in ion implantation for semiconductor devices -Si, GaAs and WBG materials-

Sun. Mar 10, 2019 1:30 PM - 5:50 PM W922 (Multi-Purpose Digital Hall)

Masayuki Imaizumi(Mitsubishi Electric), Tohru Oka(Toyoda Gosei)

△:Presentation by Applicant for JSAP Young Scientists Presentation Award
▲:English Presentation
▼:Both of Above
No Mark:None of Above

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