[11a-PA5-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11a-PA5-10] Cryo- etching of silicon oxide film by low-energy electron irradiation generated by DC discharge on NF3 condensation layer formed on SiO2 substrate.

〇Hitoshi Kumagai¹ (1.Yamanashi Univ.)

Keywords:etching, low temperature, plasma