[11a-PA5-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11a-PA5-12] Development of Deposition Model of DLC Film using Low-Pressure Capacitively-coupled Hydrocarbon Plasma

〇(M1)Shin Ogawa¹, Akinori Oda¹, Takayuki Ohta², Hiroyuki Kousaka³ (1.Chiba Tech, 2.Meijo Univ., 3.Gifu Univ.)

Keywords:Plasma enhunced chemical vapor deposition, Thin film deposition simulation, Capacitively-coupled Plasma