The 66th JSAP Spring Meeting, 2019

Presentation information

Poster presentation

13 Semiconductors » 13.3 Insulator technology

[11a-PB2-1~10] 13.3 Insulator technology

Mon. Mar 11, 2019 9:30 AM - 11:30 AM PB2 (PB)

9:30 AM - 11:30 AM

[11a-PB2-2] Study of Vo diffusion barrier in SiO2 with lattice constant modulation

〇(M1)Kohei Yata1, Hiroyuki Kageshima1 (1.Shimane Univ.)

Keywords:SiO2, Oxygen vacancy, First-principles calculation