The 66th JSAP Spring Meeting, 2019

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13 Semiconductors » 13.3 Insulator technology

[11a-PB2-1~10] 13.3 Insulator technology

Mon. Mar 11, 2019 9:30 AM - 11:30 AM PB2 (PB)

9:30 AM - 11:30 AM

[11a-PB2-9] The evolution of antiferroelectric property of HfO2-ZrO2 thin film

〇Shigehisa Shibayama1, Mitsuo Sakashita1, Osamu Nakatsuka1,2, Shigeaki Zaima3 (1.Nagoya Univ., 2.IMaSS, Nagoya Univ., 3.IIFS, Nagoya Univ.)

Keywords:HfO2, ZrO2, antiferroelectric