[11a-PB2-1~10] 13.3 Insulator technology

[11a-PB2-10] The physical origin of the suppression of hole leakage by Hf incorporation in AlON

〇(M2)Takuya Nagura¹, Kenta Chokawa¹, Masaaki Araidai^1,2, Takuji Hosoi³, Heiji Watanabe³, Atsushi Oshiyama², Kenji Shiraishi^1,2 (1.Graduate School of Engineering, Nagoya Univ., 2.IMaSS, Nagoya Univ., 3.Graduate School of Engineering, Osaka Univ.)

Keywords:First principles calculation, AlON