Fabrication of HfO<sub>2</sub>/Ge direct junction structure using Kr/O<sub>2</sub> plasma oxidation method

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Mon. Mar 11, 2019 1:15 PM - 5:15 PM M136 (H136)

Takanobu Watanabe(Waseda Univ.), Koji Kita(Univ. of Tokyo), Kiyoteru Kobayashi(Tokai Univ.)

5:00 PM - 5:15 PM

〇Takeshi Tokorozuki¹, Yoshitaka Iwazaki¹, Tomo Ueno¹ (1.TUAT)

Keywords:germanium