The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)

Daisuke Ogawa(Chubu Univ.), Kazunori Shinoda(HITACHI)

2:30 PM - 2:45 PM

[11p-W641-4] Mechanism of light element injection in III-V semiconductor compounds

Yoshinori Kodama1, Yoshifumi Zaizen1, Masanaga Fukasawa1, Katsuhisa Kugimiya1, Kojiro Nagaoka1 (1.Sony Semiconductor Solutions)

Keywords:etching, plasma, damage