3:00 PM - 3:15 PM
[11p-W641-6] Prediction of Sputtering Yields by Machine Learning
Keywords:Machine Learning, Sputtering Yield
Presentation information
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[11p-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Mon. Mar 11, 2019 1:45 PM - 5:30 PM W641 (W641)
Daisuke Ogawa(Chubu Univ.), Kazunori Shinoda(HITACHI)