[12a-PB1-1~9] 8.1 Plasma production and diagnostics

[12a-PB1-6] Micro- and macro-pulse designs in high power pulsed magnetron sputtering and the optical emission spectroscopy for generated plasma

〇Yuki Nakagomi¹, Yoshihiro Hirai¹, Hiroshi Nishida¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Hiroaki Yamamoto², Masahide Tona², Keizo Tsukamoto², Keijiro Ohshimo³, Fuminori Misaizu³ (1.Tokyo Polytechnic Univ., 2.Ayabo Corp, 3.Tohoku Univ.)

Keywords:magnetron sputtering, plasma diagnostics, optical measurement

Several running systems with deferent type high voltage pulsed power supply have been proposed in high power pulsed magnetron sputtering (HPPMS). As one of them, there is modulated pulsed power system that the micro pulse series control the waveform of output power pulse (commonly called “macro pulse”). In the last presentation, the optical emission characteristics of plasma generated by controlling macro-pulse waveforms have been reported. In order to get information on the possibility of controlling the plasma characteristics, the optical emission spectroscopy was performed by controlling micro-pulse waveforms under the condition where the macro-pulse waveform was fixed.
As a result, it was found that the rise time of sputtering currents and the formation of the light-emitting atomic ions (Ti⁺ and Ar⁺) were controlled by the micro-pulse waveforms.