[12a-PB1-1~9] 8.1 Plasma production and diagnostics

[12a-PB1-5] Delayed discharge and optical emission characteristics in high power pulsed magnetron sputtering with Ar flow control

〇(M1)Hiroshi Nishida¹, Yoshihiro Hirai¹, Yuki Nakagomi¹, Nobuo Nishimiya¹, Masaomi Sanekata¹, Hiroaki Yamamoto², Masahide Tona², Keizo Tsukamoto², Keijiro Ohshimo³, Fuminori Misaizu³ (1.Tokyo Polytechnic Univ., 2.Ayabo Corp, 3.Tohoku Univ.)

Keywords:magnetron sputtering, plasma diagnostics, optical measurement

High power pulsed magnetron sputtering (HPPMS) is attracting attention as an advanced PVD technique which enables high hardness and high wear resistant film formation. The dependence on working pressure by controlling the sputtering-gas Ar flow rate in HPPMS and the optical emission spectroscopy for plasma were investigated in this study. HPPMS in low working pressure presented the remarkable delayed discharge and the increase of sputtering current. In addition, atomic lines of Ar⁺ ion were dominantly observed in the emission spectra in the range of the large delayed rise time for the current. Based on the results, we will discuss on the characteristics of the current-voltage waveform and the discharge mechanism in relation to atomic processes for the optical-emission species.