The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[12a-W641-1~14] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Tue. Mar 12, 2019 9:00 AM - 12:45 PM W641 (W641)

Keigo Takeda(Meijo Univ.), Haruka Suzuki(Nagoya Univ.)

10:00 AM - 10:15 AM

[12a-W641-5] Surface Modification of Polytetrafluoroethylene
by Atmospheric Pressure Plasma of Ar/Water and Ethanol Vapor Mixture

〇(B)Masahiko Tani1, Hideki Yajima2, Hiroshi Furuta1, Akimitsu Hatta1 (1.Kochi Univ. Technol., 2.ORC Manufacturing)

Keywords:Atmospheric Pressure Plasma, Polytetrafluoroethylene