The 66th JSAP Spring Meeting, 2019

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13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[9p-M114-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Sat. Mar 9, 2019 1:15 PM - 3:45 PM M114 (H114)

Yasuo Cho(Tohoku Univ.), Wenchang Yeh(Shimane Univ.)

1:30 PM - 1:45 PM

[9p-M114-2] SiC Nano-Dot Formation in Poly-Si and Amorphous-Si Substrates
using Hot C+ Ion Implantation (Ⅱ) : C+ Dose Dependency

〇Rikito Kanazawa1, Takashi Aoki1, Toshiyuki Sameshima2, Tomohisa Mizuno1 (1.Kanagawa Univ., 2.Tokyo Univ Agri. Tech.)

Keywords:Semiconductor, SiC, Quantum dot