[9p-PB3-1~28] 12.1 Fabrications and Structure Controls

[9p-PB3-6] I-V characteristics of vapor-deposited thin films of naphthalene diimide derivatives

〇Takuya Izumi¹, Takaki Saito², Hiroaki Usui², Satoshi Usui³ (1.Tokyo Univ. Agri. & Tech., 2.Grad. Sch. Tokyo Univ. Agri. & Tech., 3.Niigata. Univ.)

Keywords:thin film, vacuum deposition

It became clear that slight differences in molecular structure in organic semiconductor thin films have a great influence on physical properties. Thin films of naphthalene diimide derivatives having different molecular structures were prepared. As a result, a change in the film structure due to crystallization was observed on one side, while the other remained an amorphous structure. Examining the electrical characteristics of both, the crystalline film allowed better current flow. Crystallization works favorably in electron transport but further deterioration of morphology is expected, so further investigation of molecular structure is necessary.