The 66th JSAP Spring Meeting, 2019

Presentation information

Poster presentation

16 Amorphous and Microcrystalline Materials » 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[9p-PB4-1~11] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

Sat. Mar 9, 2019 4:00 PM - 6:00 PM PB4 (PB)

4:00 PM - 6:00 PM

[9p-PB4-4] Radiophotoluminescence phenomenon in Cu-doped silica glasses prepared from porous silica glass

Yuya Takada1, Ryo Hashikawa1, Atsushi Kinomura2, Takeshi Saito2, Takashi Wakasugi1, Kohei Kadono1 (1.Kyoto Inst. Tech., 2.KURNS)

Keywords:Radiophotoluminescence, Cu, Silica glass

Materials exhibiting high performance radiophotoluminescence (RPL) phenomenon are expected to be applied for dosimeters. Here, we report the RPL behavior of the Cu-doped silica glasses prepared through the process consisting of the immersion in a dilute solution containing copper and the subsequent sintering from a porous silica glass as a starting material. We observed well RPL phenomenon for the Cu-doped silica glasses; the intensity of the luminescence became more than twice after the exposure to approximately 800 Gy of gamma-ray and the proportionality of the intensity versus irradiation dose was confirmed. We investigated the relationship between the behaviors of the RPL and the preparation conditions of the Cu-doped silica glasses.