The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[9p-W323-1~17] 8.1 Plasma production and diagnostics

Sat. Mar 9, 2019 1:30 PM - 6:00 PM W323 (W323)

Hiroshi Akatsuka(Tokyo Tech), Tsuyohito Ito(東大)

3:15 PM - 3:30 PM

[9p-W323-8] Experimental study of dual-frequency CCP characteristics

〇(M1)Akihiro Mitsuya1, Makoto Moriyama1, Haruka Suzuki1, Hirotaka Toyoda1 (1.Nagoya univ.)

Keywords:dual-frequency CCP, plasma density, self-bias potential