Poster presentation

[12p-PA2-1~4] 7 Beam Technology and Nanofabrication

Thu. Mar 12, 2020 1:30 PM - 3:30 PM PA2 (PA)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 3:30 PM

[12p-PA2-1] Reaction induced electron beam of resist material based on Cu complex

〇Ayako Nakajima¹, Takahiro Kozawa¹ (1.Osaka Univ. ISIR)

1:30 PM - 3:30 PM

[12p-PA2-2] Influence of polyalcohol in developer contact angle to novolac type positive-tone resist.

〇Syunpei Kajita¹, Yukiko Miyaji¹, Hideo Horibe² (1.Sakamoto Co.,Ltd., 2.Osaka-City Univ.)

1:30 PM - 3:30 PM

△ [12p-PA2-3] Sputtering of Ag and Au Nanoparticles bombarded with 5 to 100 keV Ar Ions

〇Hitomi Mizutani¹, Koichi Ozaki¹, Katsumi Takahiro¹, Fumitaka Nishiyama² (1.Kyoto Inst. Tech., 2.Hiroshima Univ.)

1:30 PM - 3:30 PM

[12p-PA2-4] Versatile Photoemission Electron Microscope Designed for Real-Space and Real-time Analysis of Magnetic Dynamics

〇Takuo Ohkochi^1,2, Masaki Oura², Hitoshi Osawa¹, Akinobu Yamaguchi^3,2, Hidenori Fujiwara^4,2 (1.JASRI, 2.RIKEN/SPring-8, 3.Univ. Hyogo, 4.Osaka Univ.)

Sessions

7 Beam Technology and Nanofabrication » 7 Beam Technology and Nanofabrication(Poster)

[12p-PA2-1~4] 7 Beam Technology and Nanofabrication

[12p-PA2-1] Reaction induced electron beam of resist material based on Cu complex

[12p-PA2-2] Influence of polyalcohol in developer contact angle to novolac type positive-tone resist.

△ [12p-PA2-3] Sputtering of Ag and Au Nanoparticles bombarded with 5 to 100 keV Ar Ions

[12p-PA2-4] Versatile Photoemission Electron Microscope Designed for Real-Space and Real-time Analysis of Magnetic Dynamics

Authentication