The 67th JSAP Spring Meeting 2020

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Oral presentation

Joint Session K "Wide bandgap oxide semiconductor materials and devices" » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[12a-D419-1~12] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Mar 12, 2020 9:00 AM - 12:15 PM D419 (11-419)

Kosaku Shimizu(Nihon Univ.), Keisuke Ide(Tokyo Tech)

9:15 AM - 9:30 AM

[12a-D419-2] [Highlight]Electronic structure of interstitial hydrogen in wide gap semi-conductor InGaZnO4

Masatoshi Hiraishi1, Kenji Kojima2, Hirotaka Okabe1, Akihiro Koda1,3, Ryosuke Kadono1,3, Keisuke Ide4, Satoru Matsuishi5, Hideya Kumomi5, Toshio Kamiya4,5, Hideo Hosono4,5 (1.KEK-IMSS, 2.TRIUMF, 3.Sokendai, 4.Tokyo Tech MSL, 5.MCES)

Keywords:IGZO, muon, hydrogen

We performed Muon-Spin-Rotation experiment to investigate the electronic structure of impurity hydrogen in InGaZnO4 (IGZO). Muon (Mu) in a matter can be regarded as the pseudo-hydrogen. We revealed that muon may locate the bonding center of Zn-O in the as-deposited crystalline IGZO and amorphous IGZO. However, muon in hydrogen-charged amorphous IGZO may tend to form a Mu--H- complex in the oxygen vacancy.