The 67th JSAP Spring Meeting 2020

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13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[14p-A305-1~14] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Sat. Mar 14, 2020 1:45 PM - 5:30 PM A305 (6-305)

Hiroshi Ikenoue(Kyushu Univ.), Masato Sone(Tokyo Tech)

2:45 PM - 3:00 PM

△ [14p-A305-5] Reduction of metal/n-Ge contact resistivity by epitaxial HfGe2 formation

〇Kazuki Senga1, Shigehisa Shibayama1, Osamu Nakatsuka1,2 (1.Grad. Sch. of Eng., Nagoya Univ., 2.IMaSS, Nagoya Univ.)

Keywords:Contact resistivity, HfGe2, TLM