[15p-A305-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[15p-A305-3] Growth of Si Thin Films on Polyimide Substrates by the (100) CW-Laser Crystallization

〇Nobuo Sasaki^1,2,3, Muhammad Arif², Yukiharu Uraoka², Jun Gotoh³, Shigeto Sugimoto³ (1.Sasaki Consulting, 2.NAIST, 3.V-technology)

Keywords:Laser Crystallization, Crystal Orientation, SOI

Crystal growth of 50 nm thin Si films were carried out on polyimide substrates by the (100) oriented CW laser crystallization with a one time scan.