Takashi Nishimura

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 1:30 PM - 5:45 PM N302 (Oral)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10p-N302-1~15] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:30 PM - 2:45 PM

[10p-N302-5] Liquid phase epitaxy of silicon protrusions on a metal deposited silicon wafer, fabricated near a narrow path fused by DC heating

〇Takashi Nishimura¹, Masahiko Tomitori² (1.Suzuka college, 2.JAIST)