Hideaki Tanimura

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 1:30 PM - 5:45 PM N302 (Oral)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10p-N302-1~15] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:45 PM - 4:00 PM

[10p-N302-9] Formation of germanide using flash lamp annealing (FLA) and influence of annealing on active impurities

〇Hideaki Tanimura¹, Hikaru Kawarazaki¹, Shinichi Kato¹, Ryota Wada², Takahiro Higuchi², Tsutomu Nagayama², Takashi Kuroi² (1.SCREEN Semiconductor Solutions, 2.NISSIN ION EQUIPMENT)

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