Takuro Matsuo

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Speaker, Author, Co-Author

Fri. Sep 10, 2021 1:30 PM - 5:45 PM N302 (Oral)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10p-N302-1~15] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:15 PM - 3:30 PM

[10p-N302-7] Low temperature (~250°C) fabrication process for Ge spin MOSFET

〇Takuro Matsuo¹, Keisuke Yamamoto¹, Dong Wang¹ (1.Kyushu Univ.)

Thu. Sep 23, 2021 9:00 AM - 10:40 AM P06 (Poster)

Poster presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[23a-P06-1~5] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

9:00 AM - 10:40 AM

[23a-P06-4] Improvement of current drivability for metal S/D Ge n-MOSFET by introduction of recessed channel structure

〇Takuro Matsuo¹, Keisuke Yamamoto¹, Dong Wang¹ (1.Kyushu Univ.)