Effect of Pinholes at Side Walls on Water Flow of Batch-Type Silicon Wafer Wet Cleaning Bath

Takahashi Toshihiko; Toko Tsuchida; Habuka Hitoshi; Goto Akihiro

Presentation information

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[10p-N304-1~10] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Fri. Sep 10, 2021 1:30 PM - 4:15 PM N304 (Oral)

Koichiro Saga(Sony), Nobuya Mori(Osaka Univ.)

1:30 PM - 1:45 PM

[10p-N304-1] Effect of Pinholes at Side Walls on Water Flow of Batch-Type Silicon Wafer Wet Cleaning Bath

Takahashi Toshihiko¹, 〇Toko Tsuchida¹, Habuka Hitoshi¹, Goto Akihiro² (1.Yokohama National Univ., 2.Pre-Tech)

Keywords:water flow, cleaning bath

In order to increase the cleaning efficiency of silicon wafers, a discharge port was provided at the top of the side (two) walls of the cleaning tank to suppress water flow circulation, and it was examined by numerical calculation. In this study, it was verified by a visualization experiment.