[11a-S301-1~7] Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control

[11a-S301-7] Thermal-cyclic atomic layer etching of cobalt via oxide and organometallic complex

〇Sumiko Fujisaki¹, Yoshihide Yamaguchi¹, Hiroyuki Kobayashi¹, Kazunori Shinoda¹, Masaki Yamada¹, Hirotaka Hamamura¹, Kohei Kawamura², Masaru Izawa² (1.Hitachi, Ltd., R&D group, 2.Hitachi High-Tech)

Keywords:ALE, cobalt, organometallic complex