Symposium (Oral)
Symposium » Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control
Sat. Sep 11, 2021 9:00 AM - 11:40 AM S301 (Oral)
Takeshi Momose(Univ. of Tokyo), Hiroki Kondo(Nagoya Univ.)
△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above
9:00 AM - 9:10 AM
〇Kazuhiro Karahashi1 (1.Osaka Univ.)
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9:10 AM - 9:40 AM
〇Yukihiro Shimogaki1 (1.The Univ. of Tokyo)
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9:40 AM - 10:10 AM
〇Yukiharu Uraoka1, Mutsunori Uenuma1 (1.NAIST)
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10:10 AM - 10:25 AM
〇Jun Yamaguchi1, Momoko Deura1, Takeshi Momose1, Yukihiro Shimogaki1 (1.The Univ. Tokyo)
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10:25 AM - 10:55 AM
〇Kenji Ishikawa1, Thi-Thuy-Nga Nguyen1, Takayoshi Tsutsumi1, Shih-Nan Hsiao1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori1 (1.Nagoya Univ.)
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10:55 AM - 11:10 AM
〇Tomoko Ito1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ.)
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11:10 AM - 11:40 AM
〇Sumiko Fujisaki1, Yoshihide Yamaguchi1, Hiroyuki Kobayashi1, Kazunori Shinoda1, Masaki Yamada1, Hirotaka Hamamura1, Kohei Kawamura2, Masaru Izawa2 (1.Hitachi, Ltd., R&D group, 2.Hitachi High-Tech)
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