[11p-S301-1~7] Atomic layer processes for future device fabrication; Understanding surface reaction dynamics and its control

[11p-S301-4] Moving from reactive ion etching to atomic layer etching

〇Kazuo Nojiri¹ (1.Nanotech Research)

Keywords:atomic layer etching, reactive ion etching, semiconductor

In this presentation, the history of dry etching technology from the reactive ion etching (RIE) to the atomic layer etching (ALE) will be explained from the aspect of etching mechanism and application. In addition, the future prospects of dry etching technology and the closer collaboration between academia and industry for further progress will be discussed.