High conductive carbon film deposition by electron cyclotron resonance (ECR) plasma

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Sun. Sep 12, 2021 1:30 PM - 5:30 PM N102 (Oral)

Kosuke Takenaka(Osaka Univ.), Hiroki Kondo(Nagoya Univ.)

4:45 PM - 5:00 PM

〇Hansin BAE¹, Hamaguchi Ikumi¹, Kensuke Sasai², Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1.Nagoya Univ., 2.Nagoya Univ. cLPS, 3.NIFS)

Keywords:High conductive carbon film deposition, PECVD, ECR plasma