Yuuto Kawato

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Speaker, Author, Co-Author

Thu. Mar 18, 2021 9:00 AM - 12:00 PM Z17 (Z17)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-Z17-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:30 AM - 11:45 AM

△ [18a-Z17-10] Influence of gas pressure for oriented AlN film growth by magnetic mirror-type magnetron cathode

〇Yuuto Kawato¹, Taisei Motomura², Tatsuo Tabaru², Masato Uehara², Tetsuya Okuyama¹ (1.NIT Kurume College, 2.AIST)