The 68th JSAP Spring Meeting 2021

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8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17a-Z03-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Mar 17, 2021 9:00 AM - 11:45 AM Z03 (Z03)

Hisataka Hayashi(KIOXIA), Tomoko Ito(阪大)

10:45 AM - 11:00 AM

▼ [17a-Z03-8] Surface reactions of fluorinated Y2O3 by H+ and O+ ion irradiation

〇(M2)Hojun Kang1, Tomoko Ito1, Junghwan Um2, Hikaru Kokura2, Taekyun Kang2, Sung-Il Cho2, Hyunjung Park2, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Memory Etch Technology Team, Samsung Electronics)

Keywords:Yttria, Fluorine