9:00 AM - 9:15 AM
〇Tomohiro Kuyama1,2, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.JSPS Research Fellow)
Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Wed. Mar 17, 2021 9:00 AM - 11:45 AM Z03 (Z03)
Hisataka Hayashi(KIOXIA), Tomoko Ito(阪大)
△:Presentation by Applicant for JSAP Young Scientists Presentation Award
▲:English Presentation
▼:Both of Above
No Mark:None of Above
9:00 AM - 9:15 AM
〇Tomohiro Kuyama1,2, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.JSPS Research Fellow)
9:15 AM - 9:30 AM
〇Takashi Hamano1,2, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ., 2.JSPS Research Fellow)
9:30 AM - 9:45 AM
〇Shota Nunomura1, Isao Sakata1, Takayoshi Tsutsumi2, Masatu Hori2 (1.AIST, 2.Nagoya Univ.)
9:45 AM - 10:00 AM
〇RYOKO SUGANO1, YOHEI ISHII2, MAKOTO MIURA3, KENICHI KUWAHARA3 (1.Hitachi R&D Group, 2.Hitachi HTA, 3.Hitachi HT)
10:00 AM - 10:15 AM
〇(M1)Taito Yoshie1, Yasufumi Miyoshi2, Takayoshi Tsutsumi1, Katsuhisa Kugimiya2, Kenji Ishikawa1, Masaru Hori1 (1.Nagoya Univ., 2.Sony Semiconductor Solutions Corp.)
10:15 AM - 10:30 AM
〇Tomoko Ito1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ.)
10:30 AM - 10:45 AM
〇(M2)Jomar Unico Tercero1,2, Akiko Hirata3, Michiro Isobe2, Masagana Fukasawa3, Magdaleno Vasquez, Jr.1, Satoshi Hamaguchi2 (1.UP Diliman, 2.Osaka Univ., 3.Sony Semicon. Corp.)
10:45 AM - 11:00 AM
〇(M2)Hojun Kang1, Tomoko Ito1, Junghwan Um2, Hikaru Kokura2, Taekyun Kang2, Sung-Il Cho2, Hyunjung Park2, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Memory Etch Technology Team, Samsung Electronics)
11:00 AM - 11:15 AM
〇Iori Hirashima1, Hiroshi Kuwahata1 (1.Toukai Univ.)
11:15 AM - 11:45 AM
〇Moritaka Nakamura1 (1.MAMO)
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