[17a-Z03-1~10] 8.2 プラズマ成膜・エッチング・表面処理

▼ [17a-Z03-8] Surface reactions of fluorinated Y₂O₃ by H⁺ and O⁺ ion irradiation

〇(M2)Hojun Kang¹、Tomoko Ito¹、Junghwan Um²、Hikaru Kokura²、Taekyun Kang²、Sung-Il Cho²、Hyunjung Park²、Kazuhiro Karahashi¹、Satoshi Hamaguchi¹ (1.Osaka Univ.、2.Memory Etch Technology Team, Samsung Electronics)

キーワード：Yttria, Fluorine