The 68th JSAP Spring Meeting 2021

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[18a-Z16-1~8] 7.3 Micro/Nano patterning and fabrication

Thu. Mar 18, 2021 9:00 AM - 11:15 AM Z16 (Z16)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

10:15 AM - 10:30 AM

[18a-Z16-5] Study on process and martial design for nanoimprint lithography based on deep learning systems

Sou Tsukamoto1, Kai Kameyama1, Hideki Tanabe1, Ryuhei Yamamura1, Hiroaki Kawata1, Masaaki Yasuda1, 〇Yoshihiko Hirai1 (1.Osaka Pref. Univ.)

Keywords:nanoimprint, design, deep learning

In order to design NIL processes for various materials, it is necessary to understand the physical and chemical properties of the materials, including their rheological properties, but sometimes it is difficult to measure them experimentally. Therefore, it has been necessary to design the process based on experience with limited knowredge. In this paper, we attempted to build a prototype of a neural network systems that can make sense of physical and chemical properties based on a knowledge database obtained from experiments and simulation analyses, and to construct a system that can estimate optimal material and process conditions.