Oral presentation

[18a-Z16-1~8] 7.3 Micro/Nano patterning and fabrication

Thu. Mar 18, 2021 9:00 AM - 11:15 AM Z16 (Z16)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

[18a-Z16-1] Research on Stereophonic Projection Exposure Using Faced Parabolic Mirrors and a Transparent Original Object

〇Toshiyuki Horiuchi¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

9:15 AM - 9:30 AM

[18a-Z16-2] Advantages of 150 kV electron beam lithography for thick resist

〇Tatsuki Sugihara^1,2, Arata Kaneko¹ (1.Tokyo Metro. Univ., 2.ELIONIX Inc.)

9:30 AM - 9:45 AM

[18a-Z16-3] Computational study of pattern formation in extreme ultraviolet lithography

〇Masanori Koyama¹, Kyohei Imai¹, Masamitsu Shirai¹, Yoshihiko Hirai¹, Masaaki Yasuda¹ (1.Osaka Pref. Univ.)

9:45 AM - 10:00 AM

[18a-Z16-4] Controlled Arrangement of Metal Nanoparticles Capped with Dithiol
on Au nanopatterns

〇Hiroki Yamamoto¹, Takahiro Kozawa², Bunsho Ohtani³ (1.QST, 2.ISIR, Osaka Univ., 3.ICAT Hokkaido Univ.)

10:15 AM - 10:30 AM

[18a-Z16-5] Study on process and martial design for nanoimprint lithography based on deep learning systems

Sou Tsukamoto¹, Kai Kameyama¹, Hideki Tanabe¹, Ryuhei Yamamura¹, Hiroaki Kawata¹, Masaaki Yasuda¹, 〇Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

10:30 AM - 10:45 AM

△ [18a-Z16-6] Analysis of internal structure of nanometer-scale photo-cured thin films doped with trimethylaluminum

〇Kohei Chiba¹, Takahiro Nakamura¹, Shunya Ito¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

10:45 AM - 11:00 AM

[18a-Z16-7] Optimization of BILM for 3-dimensional photolithography

〇(B)Tomoaki Osumi¹, Masaaki Yasuda¹, Masaru Sasago¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

11:00 AM - 11:15 AM

△ [18a-Z16-8] Dry Etching of Photo-Cured Masks for Area Selective Atomic Layer Deposition

〇Chiaki Miyajima¹, Shunya Ito¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[18a-Z16-1~8] 7.3 Micro/Nano patterning and fabrication

[18a-Z16-1] Research on Stereophonic Projection Exposure Using Faced Parabolic Mirrors and a Transparent Original Object

[18a-Z16-2] Advantages of 150 kV electron beam lithography for thick resist

[18a-Z16-3] Computational study of pattern formation in extreme ultraviolet lithography

[18a-Z16-4] Controlled Arrangement of Metal Nanoparticles Capped with Dithiol
on Au nanopatterns

[18a-Z16-5] Study on process and martial design for nanoimprint lithography based on deep learning systems

△ [18a-Z16-6] Analysis of internal structure of nanometer-scale photo-cured thin films doped with trimethylaluminum

[18a-Z16-7] Optimization of BILM for 3-dimensional photolithography

△ [18a-Z16-8] Dry Etching of Photo-Cured Masks for Area Selective Atomic Layer Deposition

Authenticate

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[18a-Z16-1~8] 7.3 Micro/Nano patterning and fabrication

[18a-Z16-1] Research on Stereophonic Projection Exposure Using Faced Parabolic Mirrors and a Transparent Original Object

[18a-Z16-2] Advantages of 150 kV electron beam lithography for thick resist

[18a-Z16-3] Computational study of pattern formation in extreme ultraviolet lithography

[18a-Z16-4] Controlled Arrangement of Metal Nanoparticles Capped with Dithiolon Au nanopatterns

[18a-Z16-5] Study on process and martial design for nanoimprint lithography based on deep learning systems

△ [18a-Z16-6] Analysis of internal structure of nanometer-scale photo-cured thin films doped with trimethylaluminum

[18a-Z16-7] Optimization of BILM for 3-dimensional photolithography

△ [18a-Z16-8] Dry Etching of Photo-Cured Masks for Area Selective Atomic Layer Deposition

Authenticate

[18a-Z16-4] Controlled Arrangement of Metal Nanoparticles Capped with Dithiol
on Au nanopatterns