The 68th JSAP Spring Meeting 2021

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[18a-Z16-1~8] 7.3 Micro/Nano patterning and fabrication

Thu. Mar 18, 2021 9:00 AM - 11:15 AM Z16 (Z16)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

10:30 AM - 10:45 AM

[18a-Z16-6] Analysis of internal structure of nanometer-scale photo-cured thin films doped with trimethylaluminum

Kohei Chiba1, Takahiro Nakamura1, Shunya Ito1, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ.)

Keywords:photo-cured resin film, sequential vapor infiltration, internal layered structure

We have studied organic-inorganic hybridization of photo-cured thin films by sequential infiltration synthesis. In this report, internal layered structures of photo-cured organic thin films caused by doping with an inorganic precursor of trimethylaluminum were analyzed by X-ray reflectivity measurements and scanning transmission electron microscopy equipped with energy dispersive X-ray spectroscopy. Respective photo-cured films made with a hydroxy-containing bisphenol A-based monomer and a hydroxy-free bisphenol A monomer had internal layered structures with different Al distributions and densities, while a photo-cured film made with their mixture had smaller difference in density than the respective photo-cured films.