[18a-Z17-1~11] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-Z17-4] Study on the atmospheric-pressure plasma synthesis of high hardness diamond-like carbon films

〇Ryota Nishimura¹, Hirotaka Mitamura¹, Hiroyuki Yoshiki¹, Hiroyuki Arafune¹ (1.Tsuruoka Kosen)

Keywords:atmospheric-pressure microplasma, DLC films, Plasma CVD

Diamond like carbon (DLC) films have outstanding properties such as large hardness, low friction coefficient and high lubrication. DLC deposition has been carried out by various methods at low pressure such as PVD (e.g. sputtering, ion plating) and CVD. On the other hand, DLC deposition using an atmospheric pressure plasma has recently attracted much attention in terms of cost reduction, continuous and fast processing [1]. In this study, the effect of H₂ addition to plasma gases and substrate temperature_. on chemical and mechanical properties of the DLC films deposited at atmospheric pressure is examined.