9:15 AM - 9:30 AM
[20a-C101-2] Mask production for Extreme Ultraviolet (EUV) Lithography
Keywords:EUV, Mask
Presentation information
Oral presentation
7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication
[20a-C101-1~13] 7.3 Micro/Nano patterning and fabrication
Tue. Sep 20, 2022 9:00 AM - 12:30 PM C101 (C101)
Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)