The 83rd JSAP Autumn Meeting 2022

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[20a-C101-1~13] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 20, 2022 9:00 AM - 12:30 PM C101 (C101)

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

9:45 AM - 10:00 AM

[20a-C101-4] Verification of Resist Patterning by Stereophonic Projection Lithography Using a Pair of Parabolic Mirrors Illuminated by Collimated Light from a Blue Light-Emitting-Diode

Toshiyuki Horiuchi1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)

Keywords:stereophonic projection lithography, parabolic mirror, collimated illumination

Resist patterning was demonstrated by stereophonic projection lithography using a pair of faced parabolic mirrors. A spoon with patterns on the surface was used as the reticle object. The reticle object was placed at the center of the lower mirror, and it was illuminated obliquely from the bottom by a collimated light from a blue light-emitting-diode source. When the illumination angle and the light source position were optimized, images of patterns on the reticle object were projected clearly on a spoon coated with a resist film. Resist patterns were successfully printed by the projection exposure and the following development.