Fermi-Level Pinning alleviation and Schottky barrier control on metal/poly-crystalline Ge

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Wed. Sep 21, 2022 9:00 AM - 11:15 AM A406 (A406)

Kaoru Toko(Univ. of Tsukuba), Junji Yamanaka(Univ. of Yamanashi)

10:45 AM - 11:00 AM

〇(M2)Tomonari Takayama¹, Kenta Moto^1,2, Kaoru Toko³, Dong Wang¹, Yamamoto Keisuke¹ (1.Kyusyu Univ., 2.JSPS Res. Fellow, 3.Univ. of Tsukuba)

Keywords:polycrystalline Ge, Schottky barrier contorol, Fermi-Level Pinning