5:45 PM - 6:00 PM
▼ [21p-B203-17] Fabrication of conductive anatase Ti1−xNbxO2 thin films by mist chemical vapor deposition
Keywords:mist chemical vapor deposition, conductive Nb:TiO2
Niobium-doped anatase titanium dioxide (Ti1−xNbxO2: TNO) thin films have gained much attention as a transparent conducting oxide. The deposition of TNO thin films have been mainly studied in vacuum physical vapor deposition. Herein, we alternatively applied mist chemical vapor deposition (mist-CVD) to the TNO thin films deposition, which is a high-throughput, scalable, cost-effective, and environmentally-friendly process. Although the fabrication of TNO thin films by mist-CVD have been reported, it is limited to highly toxic solvent toluene. In this study, we demonstrate that less toxic ethanol is effective on the fabrication of conductive TNO thin films.